| 08:30 – 09:15 | Registration | |
| 09:15 – 09:20 | Opening Remarks (Tutorial Chair: Kangchun Lee) | |
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Session 1: The "M" in CMP: Mechanical Aspects of
Planarization
(Session Chair: Kangchun Lee)
|
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| 09:20 – 10:20 | Fundamentals of CMP Mechanics |
Prof. Hyunseop Lee (Dong-A Univ.) |
| 10:20 – 11:20 | Introduction to CMP Equipment |
Dr. Sukbae Joo (Applied Materials) |
| 11:20 – 12:20 | Fundamentals of Pads |
Prof. Sanha Kim (KAIST) |
| 12:20 – 13:30 | Lunch | |
|
Session 2: The "C" in CMP: Chemical Aspects of Planarization
(Session Chair: Sanha Kim)
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| 13:30 – 14:30 | Fundamentals of CMP Abrasives |
Prof. Kangchun Lee (Kwangwoon Univ.) |
| 14:30 – 15:30 | Fundamentals of CMP Chemistry |
Prof. Jihoon Seo (Hanyang Univ.) |
| 15:30 – 15:50 | Coffee Break | |
|
Session 3: Beyond the "C" & "M": Cleaning and Process
Control
(Session Chair: Jihoon Seo)
|
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| 15:50 – 16:50 | Fundamentals of Post-CMP Cleaning |
Prof. Taegon Kim (Hanyang Univ.) |
| 16:50 – 17:50 | AI-assisted CMP: A Case-based Introduction |
Dr. Hanchul Cho (KITECH) |
| 17:50 – 17:55 | Closing Remarks (Tutorial Chair: Kangchun Lee) | |
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